Characterization of Heusler Alloy Thin Film, $Cu_{2}MnAl$ and $Co_{2}MnSi$, Deposited by Co-sputtering Method

  • Kim Keewon (Department of Mataerials Science and Engineering, POSTECH) ;
  • Kwon Soon-Ju (Department of Mataerials Science and Engineering, POSTECH) ;
  • Kim Tae-Wan (Materials & Devices Lab. Samsung Advanced Institute of Technology (SAIT))
  • Published : 2003.12.01