Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Electron Density Measurement of Inductively Coupled Plasma Using Langmuir Probe

Langmuir Probe를 이용한 유도결합형 플라즈마의 전자 밀도 측정

  • Lee, Young-Hwan (School of Electrical Electronic and Information Engineering, Wonkwang Univ.) ;
  • Jo, Ju-Ung (School of Electrical Electronic and Information Engineering, Wonkwang Univ.) ;
  • Kim, Kwang-Soo (School of Electrical Electronic and Information Engineering, Wonkwang Univ.) ;
  • Park, Dae-Hee (School of Electrical Electronic and Information Engineering, Wonkwang Univ.)
  • 이영환 (원광대학교 전기 전자 및 정보 공학부) ;
  • 조주웅 (원광대학교 전기 전자 및 정보 공학부) ;
  • 김광수 (원광대학교 전기 전자 및 정보 공학부) ;
  • 박대희 (원광대학교 전기 전자 및 정보 공학부)
  • Published : 2003.07.10
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Abstract

In this paper, electrical characteristics of inductively coupled plasma in an electrodeless fluorescent lamp were investigated using a Langmuir probe with a variation of argon gas pressure. The RF output was applied in the range of $5{\sim}50W$ at 13.56MHz. The internal plasma voltage of the chamber and the probe current were measured while varying the supply voltage to the Langmuir probe in the range of $-100V{\sim}+100V$. When the pressure of argon gas was increased, electric current was decreased. There was a significant electric current increase from l0W to 30W. Also, when the RF power was increased, electron density was increase. This implies that this method can be used to find an optimal RF power for efficient light illumination in an electrodeless fluorescent lamp.

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