Study on LC Aligning Capability by the UV Alignment Method on a-C:H Thin Films

  • Jo, Yong-Min (Department of Electrical and Electronic Engineering (A-226), College of Engineering, Yonsei University) ;
  • Park, Chang-Joon (Department of Electrical and Electronic Engineering (A-226), College of Engineering, Yonsei University) ;
  • Hwang, Jeoung-Yeon (Department of Electrical and Electronic Engineering (A-226), College of Engineering, Yonsei University) ;
  • Seo, Dae-Shik (Department of Electrical and Electronic Engineering (A-226), College of Engineering, Yonsei University) ;
  • Rho, Soon-Joon (Department of Metallurgical System Engineering, College of Engineering, Yonsei University) ;
  • Baik, Hong-Koo (Department of Metallurgical System Engineering, College of Engineering, Yonsei University)
  • Published : 2003.07.09

Abstract

We studied the nematic liquid crystal (NLC) aligning capabilities by the UV alignment method on a a-C:H thin film surface. A good LC alignment by UV exposure on the a-C.H thin film surface at 200 ${\AA}$ of layer thickness was achieved. Also, a good LC alignment by the UV alignment method on the a-C:H thin film surface was observed at annealing temperature of 180 $^{\circ}C$. However, the alignment defect of the NLC was observed above annealing temperature of 200 $^{\circ}C$. Consequently, the good thermal stability of LC alignment by the UV alignment method on the a-C:H thin film surface can be achieved.

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