한국정보디스플레이학회:학술대회논문집
- 2003.07a
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- Pages.897-900
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- 2003
Characterization of Chemical Vapor Condensation Reactor for Parylene-N Thin Film Deposition
- Lee, Jong-Seung (School of Chemical Engineering and Technology, Yeungnam University) ;
- Yeo, Seok-Ki (School of Chemical Engineering and Technology, Yeungnam University) ;
- Park, Chin-Ho (School of Chemical Engineering and Technology, Yeungnam University)
- Published : 2003.07.09
Abstract
Chemical vapor condensation (CVC) reactor was investigated for the deposition of Parylene-N thin films as the passivation layer for organic light emitting diodes (OLEDs). Several gas inlet manifold designs were tested to improve the deposition rate and its uniformity, and it was found that proper inlet design is crucial to get the desired film properties. Process characterization was also performed with the modified inlets to optimize the process variables.
Keywords