Effect of $O_2$ Partial Pressure on Properties of Transparent $AlO_x$ Thin Films Deposited by Reactive Ion Beam Sputtering

  • Seong, J.W. (R & D Center, P & I Corp, Shinnae Techotown) ;
  • Yoon, K.H. (Department of Ceramic Engineering, Yonsei University) ;
  • Kim, K.H. (R & D Center, P & I Corp, Shinnae Techotown) ;
  • Koh, S.K. (R & D Center, P & I Corp, Shinnae Techotown)
  • 발행 : 2003.10.17