Photolithography process investment of water soluble photoresist and Organic thin film by using it.

수용성 포토레지스트와 이를 이용한 유기 박막의 photolithography 공정 연구

  • Kim, Kwang-Hyun (Division of Electric at & Electronics & Computer Engineering Dong-A University) ;
  • Kim, Gun-Ju (Division of Electric at & Electronics & Computer Engineering Dong-A University) ;
  • Ryu, Ki.-Sung (Division of Electric at & Electronics & Computer Engineering Dong-A University) ;
  • Kim, Tae-Ho (Division of Electric at & Electronics & Computer Engineering Dong-A University) ;
  • Song, Jung-Kun (Division of Electric at & Electronics & Computer Engineering Dong-A University)
  • 김광현 (동아대학교 전기전자컴퓨터공학부) ;
  • 김건주 (동아대학교 전기전자컴퓨터공학부) ;
  • 류기성 (동아대학교 전기전자컴퓨터공학부) ;
  • 김태호 (동아대학교 전기전자컴퓨터공학부) ;
  • 송정근 (동아대학교 전기전자컴퓨터공학부)
  • Published : 2004.06.01

Abstract

In this paper, we developed a new photolithography process which used a water-soluble photoresist instead of organic solvent soluble photoresist, defined pentacene thin film. And pentacene OTFTs were fabricated with the water- soluble photolithography process.

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