Influence of Assisted lon Energy on Properties of Transparent $SiO_x$ Thin Films Deposited by Dual Ion Beam Sputtering (DIBS)

  • Seong J.W (R & D Center, P & I Co.) ;
  • Yoon K. H. (Department of Ceramic Engineering, Yonsei University) ;
  • Kim K. H. (R & D Center, P & I Co.) ;
  • Koh S. K. (R & D Center, P & I Co.)
  • 발행 : 2004.04.01