A High Aperture Ratio TFT Design for Bottom Emission Type AMOLED

  • Chien, Yao Hong (CHUNGHWA PICTURE TUBES,LTD. Mobile Product Design Division, TFT Business Unit) ;
  • Huang, Jack (CHUNGHWA PICTURE TUBES,LTD. Mobile Product Design Division, TFT Business Unit)
  • Published : 2004.08.23

Abstract

A new design for improving the aperture ratio of bottom emission type AMOLED is investigated. In conventional, the TFT of AMOLED fabrication method is "Etch Stopper (7-mask)", so the aperture ratio is limited in 28${\sim}$33% by Cs(Storage Capacitor). A high aperture ratio TFT is designed by using BCE(Back Channel Etching 5-mask) fabrication way and the aperture ratio is up to 40% shown in 2.2"AMOLED display.

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