Formation of Nano-crystal using Si-rich thin film for Non Volatile Memory Device Application

비휘발성 메모리 소자 응용을 위한 Si-rich 박막을 사용한 Nano-crystal 형성

  • Published : 2005.11.10

Abstract

In this research, non-volatile memory effects and nano-crystal creation have been investigated in SiNx containing Si nano-crystals (Si-nc) produced by ICP-CVD and rapid thermal annealing. The quantum dots were created during rapid thermal annealing of Si-rich SiNx thin films. The quantum dot creation was analyzed with photoluminescence spectra, and in case of Si-rich SiNx, it is conformed that the quantum dots are formed easily at 750$\sim$800nm wavelength.

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