Proceedings of the Korean Society of Precision Engineering Conference (한국정밀공학회:학술대회논문집)

  • 2005.10a
  • /
  • Pages.698-701
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  • 2005
  • /
  • 2005-8446(pISSN)
Korean Society for Precision Engineering (한국정밀공학회)
권호 표지

Electron beam lithography patterning research for stamper fabrication using nano-injection molding

나노사출성형용 스탬퍼 제작을 위한 Electron beam lithography 패터닝 연구

  • Uhm S.J. (Nano-Machining Center, Dep't of Intelligence and Precision Machine, Korea Institute of Machinery & Materials) ;
  • Seo Y.H. (Nano-Machining Center, Dep't of Intelligence and Precision Machine, Korea Institute of Machinery & Materials) ;
  • Yoo Y.E. (Nano-Machining Center, Dep't of Intelligence and Precision Machine, Korea Institute of Machinery & Materials) ;
  • Choi D.S. (Nano-Machining Center, Dep't of Intelligence and Precision Machine, Korea Institute of Machinery & Materials) ;
  • Je T.J. (Nano-Machining Center, Dep't of Intelligence and Precision Machine, Korea Institute of Machinery & Materials) ;
  • Whang K.H. (Nano-Machining Center, Dep't of Intelligence and Precision Machine, Korea Institute of Machinery & Materials)
  • 엄상진 (한국기계연구원 지능형정밀기계연구본부 나노장비연구센터) ;
  • 서영호 (한국기계연구원 지능형정밀기계연구본부 나노장비연구센터) ;
  • 유영은 (한국기계연구원 지능형정밀기계연구본부 나노장비연구센터) ;
  • 최두선 (한국기계연구원 지능형정밀기계연구본부 나노장비연구센터) ;
  • 제태진 (한국기계연구원 지능형정밀기계연구본부 나노장비연구센터) ;
  • 황경현 (한국기계연구원 지능형정밀기계연구본부 나노장비연구센터)
  • Published : 2005.10.01
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Abstract

We have investigated experimentally a nano patterning using electron beam lithography for the nickel stamper fabrication. Recently, DVD and Blu-ray disk(BD) have nano-scale patterns in order to increase the storage density. Specially, BD has 100nm-scale patterns which are generally fabricated by electron beam lithography. In this paper, we found optimum condition of electron-beam lithography for 100nm-scale patterning. We controlled various conditions of EHP(acceleration voltage), beam current, dose and aperture size in order to obtain optimum conditions. We used 100nm-thick PMMA layer on a silicon wafer as photoresist. We found that EHP was the most dominant factor in electron-beam lithography.

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