Monitering System of Silicon Wafer Grinding Process Using for the Change of Motor Current

모터 전류 변화를 이용한 실리콘 웨이퍼 연삭 공정 모니터링 시스템

  • 박선준 (부산대 대학원 정밀기계공학과) ;
  • 김성렬 (부산대 대학원 정밀기계공학과) ;
  • 이상직 (부산대 대학원 정밀기계공학과) ;
  • 박범영 (부산대 대학원 정밀기계공학과) ;
  • 정해도 (부산대학교 기계공학부)
  • Published : 2005.06.01

Abstract

Recently, according to the development of semiconductor industry, needed to high-integration and high-functionality. These changes are required for silicon wafer of large scale diameter and precision of TTV (Total Thickness variation). So, in this research, suggest that the method of monitoring system is using motor current. This method is needed for observation of silicon wafer grinding process. Motor current sensor is consisted of hall sensor. Hall sensor is known to catching of change of current. Received original signal is converted to the diginal, then, it is calculated RMS values, and then, it is analysed in computer. Generally, the change of force is relative to the change of current, So this reason, in this research tried to monitoring of motor current change, and then, it will be applied to analysis for silicon wafer grinding process. using motor current sensor.

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