Analysis of a micro-processed sample surface using SCM and AFM

공초점현미경과 원자현미경을 이용한 초정밀 가공된 시료 표면의 영상측정

Surface quality of a micro-processed sample with laser has been investigated by using of scanning confocal microscope(SCM) and atomic force microscope(AFM). Samples are bump electrodes and ITO glass of LCD module used in a mobile phone and a wafer surface scribed by UV laser. A image of $140\times120{\mu}m^2$ is obtained within 1 second by SCM because scan speed of a x-axis and y-axis are 1kHz and 1Hz, respectively. AFM is able to measure correctly hight and width of ITO and scribing depth and width of a wafer with a resolution less than 300 . However, the scan speed is slow and it is difficult to distinguish a surface composed of different nm kinds of materials. Results show that SCM is preferable to obtain a image of a sample composed of different kinds of material than AFM because the intensity of a reflected light from surface is different from each material.