한국정보디스플레이학회:학술대회논문집
- 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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- Pages.598-601
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- 2005
Z-correction, a new method to improve TFT mask set overlay for TFT production yield enhancement
- Ekberg, Peter (Micronic Laser Systems AB, Box 3141) ;
- Sjostrom, Fredrik (Micronic Laser Systems AB, Box 3141) ;
- Stiblert, Lars (Micronic Laser Systems AB, Molndalsvagen 91)
- 발행 : 2005.07.19
초록
Z-correction is new method to be used when measuring pattern registration of photomasks. The method is based on measurement of the plate profile in the Zaxis and takes into account the impact on the registration deviations caused by plate support, contamination as well as the photomask flatness itself. Z-correction further facilitates a more neutral way of judging the overlay properties between individual photomasks within a mask set.
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