한국정보디스플레이학회:학술대회논문집

한국정보디스플레이학회 (The Korean Infomation Display Society)
권호 표지

The Influence of Poly-Si Morphology with Excimer Laser Optics System

  • Peng, Yao (Institute of Electro-Optical Engineering, NCTU) ;
  • Chen, C.N. (Institute of Electro-Optical Engineering, NCTU)
  • 발행 : 2005.07.19
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초록

In this study, we investigate the characteristic of the poly-Si grain and morphology influenced by XeCl excimer laser system. The stable laser beam source is basic requested; the irradiation beam through optical lens module is more important which limit the grain size smaller than $0.5{\mu}m$. The homogenization lens designs control the poly-Si grain size; so we hardly get enlarge grain size by one laser irradiation scan.

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