Simple Patterning Techniques for fabrication of Organic Thin Film Transistors

  • Jo, Sung-Jin (Department of Metallurgical Engineering, Yonsei University) ;
  • Kim, Woo-Jin (Department of Metallurgical Engineering, Yonsei University) ;
  • Kim, Chang-Su (Department of Metallurgical Engineering, Yonsei University) ;
  • Baik, Hong-Koo (Department of Metallurgical Engineering, Yonsei University)
  • Published : 2005.07.19

Abstract

The influence of oxygen plasma and octadecyltrichlorosilane (OTS) treatment of $SiO_2$ on the patterning of poly(3,4-ethylenedioxythiophene)/poly(4-styrenesulfonate) (PEDOT:PSS) is presented. A significant difference in surface energies between plasma treated and OTS treated $SiO_2$ was noted. Such heterogeneous surface energy guides PEDOT:PSS to wet and spread on the wettable region and to dewet and retract from other regions.

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