Proceedings of the Polymer Society of Korea Conference (한국고분자학회:학술대회논문집)

The Polymer Society of Korea (한국고분자학회)
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Nanopore Generation in Low Dielectric Organosilicate and SiCOH Thin Films

  • Heo, Kyu-Young (Department of Chemistry, National Research Lab for Polymer Synthesis & Physics, Pohang Accelerator Laboratory, Center for Integrated Molecular Systems, Polymer Research Institute, and BK School of Molecular Science, Pohang University of Science and Technology) ;
  • Yoon, Jin-Hwan (Department of Chemistry, National Research Lab for Polymer Synthesis & Physics, Pohang Accelerator Laboratory, Center for Integrated Molecular Systems, Polymer Research Institute, and BK School of Molecular Science, Pohang University of Science and Technology) ;
  • Jin, Kyeong-Sik (Department of Chemistry, National Research Lab for Polymer Synthesis & Physics, Pohang Accelerator Laboratory, Center for Integrated Molecular Systems, Polymer Research Institute, and BK School of Molecular Science, Pohang University of Science and Technology) ;
  • Jin, Sang-Woo (Department of Chemistry, National Research Lab for Polymer Synthesis & Physics, Pohang Accelerator Laboratory, Center for Integrated Molecular Systems, Polymer Research Institute, and BK School of Molecular Science, Pohang University of Science and Technology) ;
  • Oh, Kyoung-Suk (Nano-Thin Film Materials Laboratory, Department of Physics, Cheju National University) ;
  • Choi, Chi-Kyu (Nano-Thin Film Materials Laboratory, Department of Physics, Cheju National University) ;
  • Ree, Moon-Hor (Department of Chemistry, National Research Lab for Polymer Synthesis & Physics, Pohang Accelerator Laboratory, Center for Integrated Molecular Systems, Polymer Research Institute, and BK School of Molecular Science, Pohang University of Science and Technology)
  • Published : 2006.10.13
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Abstract

There has been much interest in incorporating nanoscale voids into dielectric materials in order to reduce their k value, and thus in producing low-k porous interdielectric materials. One approach to the development of low-k dielectric materials is the templated polycondensation of organosilicate precursors in the presence of a thermally labile, organic polymeric porogen. The other is SiOCH films have low dielectric constant as well as good mechanical strength and high thermal stability through PECVD. In this article we explore the nanopore generation mechanism of organosilicate film using star-shape porogen and SiOCH film using bis-trimethylsilylmethane (BTMSM) precursor.

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