한국정보디스플레이학회:학술대회논문집
- 2006.08a
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- Pages.18-20
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- 2006
Contaminations of MgO Thin Films by Phosphors for the Surface and Vertical Discharge Type AC-PDP
- Jen, Ko-Ruey (Laboratory for Nanosystem and Plasma, Deptartment of Photonics and Display Institute, National Chiao Tung University) ;
- Kim, Sung-O (Laboratory for Nanosystem and Plasma, Deptartment of Photonics and Display Institute, National Chiao Tung University) ;
- Chen, Kuang-Lang (OPTO-Electronics Business Unit, Chunghwa Picture Tubes, LTD) ;
- Chen, Samuel (OPTO-Electronics Business Unit, Chunghwa Picture Tubes, LTD) ;
- Lee, Chien-Pang (OPTO-Electronics Business Unit, Chunghwa Picture Tubes, LTD) ;
- Huang, Chih-Ming (OPTO-Electronics Business Unit, Chunghwa Picture Tubes, LTD) ;
- Hsu, Chien-Hsing (OPTO-Electronics Business Unit, Chunghwa Picture Tubes, LTD)
- Published : 2006.08.22
Abstract
The panels were fabricated to characterize the contamination of Magnesium Oxide (MgO) thin films by phosphors and ion bombardments in AC-PDPs. Forty-six inch WVGA panels of the surface and vertical discharge type were manufactured. The experiment was designed to investigate the relationship between the MgO thin films and phosphor contamination caused by ion bombardments in a plasma environment to produce a life time test. The contamination of MgO thin films by phosphors was investigated by way of X-ray photoelectron spectroscopy (XPS).
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