한국정보디스플레이학회:학술대회논문집
- 2006.08a
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- Pages.323-327
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- 2006
Recent Advances in Poly-Silicon Crystallization
- Klene, Brian (TCZ) ;
- Knowles, David S. (TCZ) ;
- Bowen, M. Shane (TCZ) ;
- Turk, Brandon A. (TCZ)
- Published : 2006.08.22
Abstract
We present the most recent experimental results on Thin-beam Directional X'tallization (TDX), a rapid excimer-laser-based crystallization method for creating extremely high-quality large-grained polycrystalline silicon films on glass substrates. We will present experimental data obtained with our prototype Gen 2 tool, and discuss the ability to produce different types of poly-Si material.
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