($TruNano^{TM}$ processing of color photoresist for the flexible LCD module

  • Lee, Michael M.S. (UTO International Corporation) ;
  • Moon, Byung-Chun (School of Display Engineering, Hoseo University) ;
  • Bae, Byung-Seong (School of Display Engineering, Hoseo University) ;
  • Kim, Woo-Young (School of Display Engineering, Hoseo University) ;
  • Kim, Nam-Hoon (Dept. of Materials Science and Engineering, Hoseo University) ;
  • Cheon, Chae-Il (Dept. of Materials Science and Engineering, Hoseo University) ;
  • Kim, Jeong-Seog (School of Display Engineering, Hoseo University)
  • Published : 2006.08.22

Abstract

We present a low temperature thermal process for the color photoresist on the flexible substrate for the LCD color filter module by the $TruNano^{TM}$ processor in combination with a compositional modification to the conventional color photoresist. By this method the curing temperature can be lowered by more than $100^{\circ}C$, and the curing process time also can be shortening by more than 20 min.

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