(100) Textured Si Films with Controlled Microstructures Obtained via Hybrid SLS

  • Wilt, P.C. Van Der (Program in Materials Science and Engineering, Department of Applied Physics and Applied Mathematics, Columbia University) ;
  • Chitu, A.M. (Program in Materials Science and Engineering, Department of Applied Physics and Applied Mathematics, Columbia University) ;
  • Turk, B.A. (Program in Materials Science and Engineering, Department of Applied Physics and Applied Mathematics, Columbia University) ;
  • Chung, U.J. (Program in Materials Science and Engineering, Department of Applied Physics and Applied Mathematics, Columbia University) ;
  • Limanov, A.B. (Program in Materials Science and Engineering, Department of Applied Physics and Applied Mathematics, Columbia University) ;
  • Im, James S. (Program in Materials Science and Engineering, Department of Applied Physics and Applied Mathematics, Columbia University)
  • Published : 2006.08.22

Abstract

Uniformity and performance characteristics of LTPS TFTs are important parameters for making advanced active-matrix displays. In this paper, we describe an SLS-based crystallization approach for producing orientation-controlled Si films with reduced concentrations of planar defects that stand to potentially deliver unprecedented levels of device uniformity and performance. Specifically, a 2-step process referred to as hybrid SLS has been developed that produces a variety of high-quality {100} surface-oriented Si films.

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