MgO Properties Depending on E-beam Evaporation Rate and Its Effects on the PDP Discharging Characteristics

  • Kwon, Sang-Jik (Dept. of Electronics Eng., Kyungwon University) ;
  • Kim, Yong-Jae (Dept. of Electronics Eng., Kyungwon University) ;
  • Li, Zhao Hui (Dept. of Electronics Eng., Kyungwon University) ;
  • Kim, Kwang-Ho (Dept. of Electronics Eng., Kyungwon University) ;
  • Lee, Dal-Ho (Dept. of Electronics Eng., Kyungwon University)
  • Published : 2006.08.22

Abstract

Effects of the evaporation rate of MgO films using electron beam were investigated on the MgO properties and the discharge characteristics of the plasma display panel (PDP). The evaporation rate was changed from 3 ${\AA}/sec$ to 15 ${\AA}/sec$ at a substrate temperature of $300\;^{\circ}C$. MgO properties such as crystal orientation, surface roughness, contact angle, and film structure were inspected using XPS, AFM, drop shape analysis and SEM. We also studied the relation between MgO properties and PDP discharging characteristics. The minimum firing voltage and maximum efficacy were obtained at evaporation rate of 5 ${\AA}/sec$. In the MgO film deposited at 5 ${\AA}/sec$, (200) orientation was most intensive and surface roughness was minimum.

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