Property of gallium doped Zinc Oxide thin film deposited with various substrate temperatures using D.C. magnetron sputtering

  • Kim, Se-Hyun (Division of Materials Science and Engineering, Hanyang University) ;
  • Moon, Yeon-Geon (Division of Materials Science and Engineering, Hanyang University) ;
  • Moon, Dae-Yong (Division of Materials Science and Engineering, Hanyang University) ;
  • Park, Jong-Wan (Division of Materials Science and Engineering, Hanyang University) ;
  • Jeong, Chang-Ho (LCD R&D Center, Samsung Electronics Co., Ltd.)
  • Published : 2006.08.22

Abstract

In this paper, we study the effect of substrate temperature on property of Ga doped ZnO (GZO) thin film for transparent conductive oxide (TCO).GZO thin films have been deposited on corning glass 1737 by D.C. magnetron sputtering. We investigated the structural and electrical properties of GZO films using the X-Ray Diffractometer(XRD), Field Emission Scanning Electron Microscopy(FESEM) and 4-points probe .

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