한국정보디스플레이학회:학술대회논문집
- 2006.08a
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- Pages.1539-1543
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- 2006
Roll-to-Roll Fabrication of Active-Matrix Backplanes Using Self-Aligned Imprint Lithography (SAIL)
- Kim, Han-Jun (Hewlett Packard Laboratories) ;
- Almanza-Workman, Marcia (Hewlett Packard Laboratories) ;
- Chaiken, Alison (Hewlett Packard Laboratories) ;
- Jackson, Warren (Hewlett Packard Laboratories) ;
- Jeans, Albert (Hewlett Packard Laboratories) ;
- Kwon, Oh-Seung (Hewlett Packard Laboratories) ;
- Luo, Hao (Hewlett Packard Laboratories) ;
- Mei, Ping (Hewlett Packard Laboratories) ;
- Perlov, Craig (Hewlett Packard Laboratories) ;
- Taussig, Carl (Hewlett Packard Laboratories) ;
- Jeffrey, Frank (PowerFilm Inc.) ;
- Braymen, Steve (PowerFilm Inc.) ;
- Hauschildt, Jason (PowerFilm Inc.)
- Published : 2006.08.22
Abstract
We have developed self-aligned imprint lithography (SAIL) technology, an innovative method for roll-to-roll (R2R) fabrication of electronic devices on flexible plastic substrates. In this paper, we present the first R2R-produced
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