한국정보디스플레이학회:학술대회논문집

The Korean Infomation Display Society (한국정보디스플레이학회)
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Synthesis and characterization of negative-type photosensitive polyimides for TFT-LCD array

  • Kim, Hyo-Jin (Dept. of Polymer Science, Kyungpook National University) ;
  • Kim, Hyun-Suk (Dept. of Polymer Science, Kyungpook National University) ;
  • Kim, Soon-Hak (Dept. of Polymer Science, Kyungpook National University) ;
  • Park, Lee-Soon (Dept. of Polymer Science, Kyungpook National University) ;
  • Hur, Young-Hune (Advanced Display Manufacturing Research Center, Kyungpook National University) ;
  • Lee, Yoon-Soo (Mobile Display Research Center, Kyungpook National University) ;
  • Song, Gab-Deuk (Mobile Display Research Center, Kyungpook National University) ;
  • Kwon, Young-Hwan (Dept. of Chemical Engineering, Daegu University)
  • Published : 2006.08.22
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Abstract

Two different negative-type photosensitive polyimides were synthesized and characterized for an application as an interdielectric layer in TFTLCD array. In the case of photocurable polyimides, the photosensitive moiety, 2-HHSP, was synthesized through 3 step reaction, and then was incorporated into side chains of polyimide precursor by post reaction. Optimum compositions of negative-type photocurable polyimde were also formulated. For photopolymerizable polyimides, two novel UV monomers containing imide linkages were prepared. An aqueous alkaline developable polymer matrix was synthesized by free radical copolymerization. A negative photoresist formulation was developed utilizing synthesized UV monomers containing imide linkage, photoinitiator, UV oligomer, and alkali developable polymer matrix. It was found that viaholes with good resolution, high transmittance and thermal resistance could be obtained by photolithographic process utilizing the negative-type photoresist formulations.

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