한국정보디스플레이학회:학술대회논문집
- 2006.08a
- /
- Pages.1645-1648
- /
- 2006
A five mask CMOS LTPS process with LDD and only one ion implantation step
- Schalberger, Patrick (Chair of Display Technology, University of Stuttgart) ;
- Persidis, Efstathios (Chair of Display Technology, University of Stuttgart) ;
- Fruehauf, Norbert (Chair of Display Technology, University of Stuttgart)
- Published : 2006.08.22
Abstract
We have developed a CMOS LTPS process, which requires only five photolithographic masks and only one ion doping step. Single TFTs, inverters, ring oscillators and shift registers were fabricated. N- and p-channel devices reached field effect mobilities of
Keywords