Hot Wall Epitaxy(HWE)법에 의한 $AgGaSe_2$ 단결정 박막 성장과 특성

Growth and Study on Photo current of Valence Band Splitting for $AgGaSe_2$ single crystal thin film by hot wall epitaxy

  • 발행 : 2010.04.01

초록

Single crystal $AgGaSe_2$ layers were grown on thoroughly etched semi-insulating GaAs(100) substrate at $420^{\circ}C$ with hot wall epitaxy (HWE) system by evaporating $AgGaSe_2$ source at $630^{\circ}C$. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The temperature dependence of the energy band gap of the $AgGaSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=19501 eV-(879{\times}10^{-4} eV/K)T^2/(T+250 K)$.

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