Impedance spectroscopy analysis of organic light emitting diodes with the $CF_4$ anode plasma treatment

$CF_4$ 플라즈마 처리된 ITO박막을 이용한 유기 EL 소자의 성능향상에 관한 임피던스 분석

  • Park, Hyung-June (School of Information and Communication Engineering, Sungkyunkwan Univ.) ;
  • Kim, Hyun-Min (School of Information and Communication Engineering, Sungkyunkwan Univ.) ;
  • Lee, Jun-Sin (School of Information and Communication Engineering, Sungkyunkwan Univ.) ;
  • Sohn, Sun-Young (Dept of physics, Sungkyunkwan Univ.) ;
  • Jung, Dong-Geun (Dept of physics, Sungkyunkwan Univ.)
  • 박형준 (성균관대학교 전자전기공학과) ;
  • 김현민 (성균관대학교 전자전기공학과) ;
  • 이준신 (성균관대학교 전자전기공학과) ;
  • 손선영 (성균관대학교 물리학과) ;
  • 정동근 (성균관대학교 물리학과)
  • Published : 2006.11.09

Abstract

In this work, impedance Spectroscopic analysis was applied to study the effect of plasma treatment on the surface of indium-tin oxide (ITO) anodes using $CF_4g$ as and to model the equivalent circuit for organic light emitting diodes (OLEDs) with the $CF_4$ plasma treatment of ITO surface at the anodes. This device with ITO/TPD/$Alq_3$/LiF/Al structure can be modeled as a simple combination of a resistor and a capacitor. The $CF_4$ plasma treatment on the surface of ITO shifts the vacuum level of the ITO as a result of which the barrier height for hole injection at the ITO/organic interface is reduced. The Impedance spectroscopy measurement of the devices with the $CF_4$ plasma treatment on the surface of ITO anodes shows change of values in parallel resistance ($R_p$) and parallel capacitance ($C_p$).

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