Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2006.11a
- /
- Pages.364-365
- /
- 2006
Study of T Type Waveguide in Single Wafer Megasonic Cleaning for Post CMP
T형의 waveguide를 이용한 Post CMP용 메가소닉 세정장치에 대한 연구
- Kim, Tae-Gon (Hanyang University) ;
-
Lee, Yang-Lae
(Institute of Machinery and Materials)
;
-
Lim, Eui-Su
(Institute of Machinery and Materials)
;
-
Kang, Kook-Jin
(Institute of Machinery and Materials)
;
-
Kim, Hyun-Se
(Institute of Machinery and Materials)
;
-
Park, Jin-Goo
(Hanyang University)
- Published : 2006.11.09
Abstract
Transverse some wave was generated by T type waveguide for single wafer cleaning application T type megasonic waveguide was analyzed by acoustic pressure measurements and particle removal efficiency. Compared to conventional longitudinal waves, not like longitudinal waves, transverse waves showed changes of direction and phase which increased the cleaning efficiency.