Proceedings of the Korean Institute of Surface Engineering Conference (한국표면공학회:학술대회논문집)
- 2006.10a
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- Pages.76-76
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- 2006
Infinitely high etch selectivity during $CH_2/H_2/Ar$ inductively coupled plasma (ICP) etching of indium tin oxide (ITO) with photoresist mask
- Kim, D.Y. (School of Advanced Materials Science and Engineering & Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Ko, J.H. (School of Advanced Materials Science and Engineering & Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Park, M.S. (School of Advanced Materials Science and Engineering & Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Lee, N.E. (School of Advanced Materials Science and Engineering & Center for Advanced Plasma Surface Technology, Sungkyunkwan University)
- Published : 2006.10.19
Abstract
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