Study of measurement system for E-beam focus position compensation

전자빔 가공 포커스 위치 보정용 측정기구에 관한 기초연구

Fundamental research is conducted in order to develop measurement system for E-beam focus position compensation. In this paper, simulation results using Fresnel's formula shows effect of photoresist film thickness according to incident conditions. Also, electromagnetic simulator is developed based on Boundary Element method (BEM) and several results confirm the feasibility of the simulator.