전자빔 가공 포커스 위치 보정용 측정기구에 관한 기초연구

Study of measurement system for E-beam focus position compensation

Fundamental research is conducted in order to develop measurement system for E-beam focus position compensation. In this paper, simulation results using Fresnel's formula shows effect of photoresist film thickness according to incident conditions. Also, electromagnetic simulator is developed based on Boundary Element method (BEM) and several results confirm the feasibility of the simulator.