Proceedings of the Korean Society of Precision Engineering Conference (한국정밀공학회:학술대회논문집)
- 2006.05a
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- Pages.671-672
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- 2006
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- 2005-8446(pISSN)
Characteristic of FS-laser ablation of metal thin film with respect to the variation of material and substrate
펨토초 레이저를 이용한 박막 재료 및 기판 변화에 따른 가공 특성에 관한 연구
Abstract
We have investigated the behavior of the ultrafast laser ablation of chromium films (200nm) on the silicon and pyrex-glass(corning 7740) substrate with respect to the laser fluence and the number of laser pulses. In addition, several experiments about ITO thin film were carried out with femto-second Ti:Sapphire laser (150fs). Finally, we introduce the ablation characteristic in accordance with materials of thin film and substrate.