Characteristic of FS-laser ablation of metal thin film with respect to the variation of material and substrate

펨토초 레이저를 이용한 박막 재료 및 기판 변화에 따른 가공 특성에 관한 연구

  • 김병희 (강원대학교 기계.메카트로닉스공학과) ;
  • 신홍규 (강원대학교 기계.메카트로닉스공학과) ;
  • 이종길 (한국산업기술대 기계공학과) ;
  • 정세채 (한국표준과학연구원)
  • Published : 2006.05.01

Abstract

We have investigated the behavior of the ultrafast laser ablation of chromium films (200nm) on the silicon and pyrex-glass(corning 7740) substrate with respect to the laser fluence and the number of laser pulses. In addition, several experiments about ITO thin film were carried out with femto-second Ti:Sapphire laser (150fs). Finally, we introduce the ablation characteristic in accordance with materials of thin film and substrate.

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