Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2007.11a
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- Pages.404-405
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- 2007
Characteristic of ITO thin film with plasma surface treatment
플라즈마 표면 처리에 의한 ITO 박막 제작 특성
- Kim, Sang-Mo (Kyungwon University) ;
- Son, In-Hwan (Shinsung College) ;
- Park, Sang-Joon (Kyungwon University) ;
- Kim, Kyung-Hwan (Kyungwon University)
- Published : 2007.11.01
Abstract
Tin-doped indium thin film is outstanding material among transparent Conductive Oxide (TCO) materials. ITO thin films show a low electrical resistance(<