Technology to Fabricate PMMA Light Guiding Plate with nano pattern Using Nano Imprinting Technology

나노 임프린팅 기술에 의한 나노패턴을 갖는 PMMA 도광판 제조 기술

  • Published : 2007.11.01

Abstract

PMMA light guiding plate with nano pattern was fabricated by nano imprinting technology. Silicon mold was fabricated by conventional photolithography. A nickel stamper was fabricated by electroplating process using silicon mold. Nano imprinting was performed on PMMA plate at $140^{\circ}C$ under pressure of 20kN. The nano pattern on PMMA plate was investigated using FE-SEM.

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