Precise Resistivity Measurement Independent Of Contact Resistance Influence And Its Applications

  • Kim, Dae-Hyun (School of Electrical Engineering, Korea University) ;
  • Ryu, Hye-Yeon (School of Electrical Engineering, Korea University) ;
  • Ji, Hyun-Jin (School of Electrical Engineering, Korea University) ;
  • Lee, Jae-Woo (School of Electrical Engineering, Korea University) ;
  • Kim, Gyu-Tae (School of Electrical Engineering, Korea University)
  • Published : 2007.06.21

Abstract

A universal four-point contact measurement method, has an advantage of non-existence of contact resistance, is demonstrated by the experiments with carbon nanotubes and ZnO nanowire. Ti/Au and Pt are tried to compare the influence of contact resistance between two different metals. These metals are selected to make Ohmic contact and Schottky contact originated from their different work functions. For precise experiments, Ti/Au and Pt are separately evaporated to form double 'four-point contact electrodes' on CNTs or ZnO, and the voltage-current characteristics are measured. This method can be applied to universal resistivity measurement for nanotubes and nanowires.

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