Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)

2007.11a
/
Pages.15.1-15.1
/
2007

Materials Research Society of Korea (한국재료학회)

권호 표지

Atomic layer deposition of $Ti_2O$ thin films using $NH_3$ gas as a non-oxidizing reactant gas.

권세훈 (한국과학기술원) ;
김성욱 (한국과학기술원) ;
강상원 (한국과학기술원)

Published : 2007.11.02

PDF

⟨ Previous Next ⟩

Abstract

Keywords