Proceedings of the Korean Institute of Surface Engineering Conference (한국표면공학회:학술대회논문집)

The Korean Institute of Surface Engineering (한국표면공학회)
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Deposition and high temperature oxidation characterization of CrAlSiN thin films

  • Kim, Sun-Kyu (School of Materials Science and Engineering, University of Ulsan) ;
  • Lee, Dong-Bok (School of Advanced Materials Science and Engineering, Sungkyunkwan University)
  • Published : 2007.11.12
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Abstract

Thin films of CrAlSiN were deposited on SKD11 tool steel substrate using Cr and AlSi cathodes by a cathodic arc plasma deposition system. The influence of process parameters on the deposited film properties were investigated. The oxidation characteristics of the films were studied at temperatures ranging from 800 and 1000+C up to 50 h in air. The films showed superhardness and good oxidation resistance..

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