Proceedings of the Korean Institute of Surface Engineering Conference (한국표면공학회:학술대회논문집)

The Korean Institute of Surface Engineering (한국표면공학회)
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A study on the low temperature process of ITO film by magnetron sputtering

Magnetron Sputtering 법으로 증착한 ITO 박막의 저온공정에 관한 연구

  • Choe, Dong-Hun (Center for Advanced Plasma Surface Technology, School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
  • Geum, Min-Jong (Center for Advanced Plasma Surface Technology, School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
  • Lee, Gyo-Ung (Center for Advanced Plasma Surface Technology, School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
  • Kim, Gap-Seok (Center for Advanced Plasma Surface Technology, School of Advanced Materials Science and Engineering, Sungkyunkwan University, Institute for Plasma and Advanced Materials, Cheorwon Plasma Research Institute) ;
  • Han, Jeon-Geon (Center for Advanced Plasma Surface Technology, School of Advanced Materials Science and Engineering, Sungkyunkwan University)
  • Published : 2007.04.05
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Abstract

본 연구에서는 ion bombardment에 의한 폴리머 기판의 손상을 줄이기 위해 FTS (Facing Target Sputtering) 장치를 이용하여 투명 전극용 ITO 박막을 합성하였다. 산소와 헬륨의 혼합비율을 변수로 하여 박막을 합성한 결과, 투명전극에 적합한 낮은 비저항과 80% 이상의 투과도를 갖는 박막을 합성할 수 있었다.

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