Numerical Analysis on Silicon Film Deposition on a Heated Rotating Semiconductor Wafer from Silane Gas

실란가스를 이용한 회전 반도체 웨이퍼로의 실리콘 박막 증착 수치해석

  • Song, Gen-Soo (Aerosol and Contamination Control Labortary, Korea Institute of Industrial Technology) ;
  • Yoo, Kyung-Hoon (Aerosol and Contamination Control Labortary, Korea Institute of Industrial Technology)
  • 송근수 (한국생산기술연구원 에어로졸.오염제어 연구실) ;
  • 유경훈 (한국생산기술연구원 에어로졸.오염제어 연구실)
  • Published : 2007.06.20