한국정보디스플레이학회:학술대회논문집
- 2008.10a
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- Pages.247-249
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- 2008
Stability of Low Temperature a-Si:H TFT on Stainless Steel Substrate
- Kim, Sung-Hwan (R&D Team 2, LG Display R&D Center) ;
- Kim, Sang-Soo (R&D Team 2, LG Display R&D Center) ;
- Park, Yong-In (R&D Team 2, LG Display R&D Center) ;
- Peak, Seung-Han (R&D Team 2, LG Display R&D Center) ;
- Lee, Kyoung-Mook (R&D Team 2, LG Display R&D Center) ;
- Park, Choon-Ho (R&D Team 2, LG Display R&D Center) ;
- Lim, Yu-Sok (R&D Team 2, LG Display R&D Center) ;
- Kim, Chang-Dong (R&D Team 2, LG Display R&D Center) ;
- Kang, In-Byeong (R&D Team 2, LG Display R&D Center)
- Published : 2008.10.13
Abstract
Low Temperature a-Si:H TFT on stainless steel substrate has been developed for the flexible electrophoretic display. Stability of low temperature a-Si:H TFT is more important point than its initial device characteristics. Thus, we have studied device characteristics of low temperature a-Si:H TFT in terms of stability for driving electrophoretic display.