Discharge Characteristics of Low Xe and High Xe Content in He-Ne-Xe Gas Mixture in PDP

  • Kwon, Oh-Yung (School of Electrical Engineering and Computer Science, Seoul National Univ.) ;
  • Bae, Hyun-Sook (School of Electrical Engineering and Computer Science, Seoul National Univ.) ;
  • Whang, Ki-Woong (School of Electrical Engineering and Computer Science, Seoul National Univ.)
  • Published : 2008.10.13

Abstract

The discharge characteristics of He-Ne-Xe gas mixture with the variation of Xe content are investigated through the numerical simulation. VUV efficacy in the gas condition of low Xe content increases due to more excitation and the case of high Xe content shows the improvement of VUV efficacy with the increase of He content but decreased VUV efficacy after tthe He mixing ratio of He and Ne is 0.5 due to frequent ionization.

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