한국정보디스플레이학회:학술대회논문집

The Korean Infomation Display Society (한국정보디스플레이학회)
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Patterning of conducting polymer at micron- scale using a selective surface treatment

  • Lee, Kwang-Ho (Dept. of Materials Science and Engineering, Program for Integrated molecular System(PIMS), Gwangju institute Science and Technology(GIST)) ;
  • Kim, Sang-Mook (Dept. of Materials Science and Engineering, Program for Integrated molecular System(PIMS), Gwangju institute Science and Technology(GIST)) ;
  • Kim, Ki-Seok (Dept. of Materials Science and Engineering, Program for Integrated molecular System(PIMS), Gwangju institute Science and Technology(GIST)) ;
  • Song, Sun-Sik (Dept. of Materials Science and Engineering, Program for Integrated molecular System(PIMS), Gwangju institute Science and Technology(GIST)) ;
  • Kim, Eun-Uk (Dept. of Materials Science and Engineering, Program for Integrated molecular System(PIMS), Gwangju institute Science and Technology(GIST)) ;
  • Jung, Hee-Soo (Dept. of Materials Science and Engineering, Program for Integrated molecular System(PIMS), Gwangju institute Science and Technology(GIST)) ;
  • Kim, Jin-Ju (Dept. of Materials Science and Engineering, Program for Integrated molecular System(PIMS), Gwangju institute Science and Technology(GIST)) ;
  • Jung, Gun-Young (Dept. of Materials Science and Engineering, Program for Integrated molecular System(PIMS), Gwangju institute Science and Technology(GIST))
  • Published : 2008.10.13
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Abstract

We demonstrated micro-scale conducting polymer patterning based on a selective surface treatment. A substrate with a patterned photoresist was immersed into OTS (Octadecyltrichlosilnae) solution. The protected substrate areas were hydrophilic after removing the PR resist, where a conducting polymer solution was coated selectively by spin-coating method.

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