한국정보디스플레이학회:학술대회논문집
- 2008.10a
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- Pages.851-854
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- 2008
Improvement of Slit Photolithography Process Reliability for Four-Mask Fabrication process in TFT LCDs
- Min, Tae-Yup (Development Team, Beijing BOE Optoelectronics Technology Co., LTD.) ;
- Qiu, Haijun (Development Team, Beijing BOE Optoelectronics Technology Co., LTD.) ;
- Wang, Zhangtao (Development Team, Beijing BOE Optoelectronics Technology Co., LTD.) ;
- Gao, Wenbao (Development Team, Beijing BOE Optoelectronics Technology Co., LTD.) ;
- Choi, Sang-Un (Development Team, Beijing BOE Optoelectronics Technology Co., LTD.) ;
- Lee, Sung-Kyu (Development Team, Beijing BOE Optoelectronics Technology Co., LTD.)
- Published : 2008.10.13
Abstract
In order to reduce the manufacturing cost of TFT LCDs and cut down an amount facilities invested, there are many LCD panel makers contributes to convert the current Five-mask manufacturing process into the noble Four-mask fabrication process. We optimized the slit mask to improve the poor process reliability.