Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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The Structural and Optical Properties of Undoped ZnO Thin Films Deposited by RF Magentron Sputtering System as Functions of Working Pressures

RF magnetron sputtering 기술로 증착한 Undoped ZnO 박막의 증착 압력에 따른 구조적, 광학적 특성

  • Kim, Jae-Cheon (Dept. of Semiconductor-display Engineering, Hoseo University) ;
  • Kim, Myung-Chun (Dept. of Advanced Materials Engineering Hoseo University) ;
  • Kim, Jwa-Yeon (Dept. of Advanced Materials Engineering Hoseo University)
  • 김재천 (반도체.디스플레이공학과, 호서대학교) ;
  • 김명춘 (신소재공학과 호서대학교) ;
  • 김좌연 (신소재공학과 호서대학교)
  • Published : 2008.11.06
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Abstract

We have studied the structural and optical properties of ZnO thin film deposited on glass by RF magnetron sputtering as functions of working pressures. The grain sizes were decreased as the working pressures were increased. The average optical transmissions over all exceeded 80% for ZnO films deposited in 20, 25 and 300m torr working pressures. And the transmission spectra patterns were almost same. While the transmission spectra pattern of ZnO film deposited in 35nm torr was different with other spectra patterns obtained in 20, 25 and 30nm torr working pressures.

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