The Electrical Properties of OLED by surface Etching methode of ITO

ITO 표면 처리방법에 따른 OLED의 전기적 특성

  • Yang, Myoung-Hak (Department of Electronics Optical Community Engineering, GwangJu Univ.) ;
  • Ki, Hyun-Chul (KOPTI) ;
  • Min, Yong-Ki (Department of Electronics Optical Community Engineering, GwangJu Univ.) ;
  • Hong, Kyung-Jin (Department of Electronics Optical Community Engineering, GwangJu Univ.)
  • 양명학 (광주대학교 전자광통신공학과) ;
  • 기현철 (한국광기술원) ;
  • 민용기 (광주대학교 전자광통신공학과) ;
  • 홍경진 (광주대학교 전자광통신공학과)
  • Published : 2008.06.19

Abstract

In this study, we report that an electrical properties of OLEDs was investigated by the surface etching method of ITO Layer. The electrical properties of OLEDs was measured by IVL and optical properties by EL spectrum. The fundamental structure of OLEDs was ITO anode/TPD(400$\breve{A}$)/$Alq_3(600\breve{A})$/LiF(5$\breve{A}$)/Al(1200$\breve{A}$) cathode. The threshold voltage was low value according to the low resistance of surface. The luminance was increased by decreased surface resistance.

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