대한전자공학회:학술대회논문집 (Proceedings of the IEEK Conference)
- 대한전자공학회 2008년도 하계종합학술대회
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- Pages.385-386
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- 2008
PR(Photoresist) 분사량 측정에 관한 연구
A Study of Measuring a sophisticated Photoresist dispense
- 신동원 (삼성전자 공과대학교) ;
- 이성영 (삼성전자 공과대학교) ;
- 김상식 (MEMORY사업부 FAB5팀) ;
- 이중현 (MEMORY사업부 FAB5팀) ;
- 한민석 (MEMORY사업부 FAB5팀)
- Shin, Dong-Won (Samsung Semiconductor Institute of Technology(SSIT)) ;
- Lee, Sung-Young (Samsung Semiconductor Institute of Technology(SSIT)) ;
- Kim, Sang-Sik (FAB 5 Team, Memory Division Semiconductor Business) ;
- Lee, Joong-Hyeon (FAB 5 Team, Memory Division Semiconductor Business) ;
- Han, Min-Suk (FAB 5 Team, Memory Division Semiconductor Business)
- 발행 : 2008.06.18
초록
Reducing the PR(Photoresist) dispense Rate is one of the important issues in Photolithography. It is a main concern that variation in PR dispense rate and existance of microbubble. so we need to measure the photoresist dispense rate more precisely. This paper presented a noble sensor of measuring the PR dispense and detecting the microbubble.
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