한국정보디스플레이학회:학술대회논문집
- 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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- Pages.594-596
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- 2009
A Novel Reactive Sputtered Passivation for Large Size TFT-LCD
- Kim, Hong-Sik (Advanced Development Division, LG Display) ;
- Lim, Joo-Soo (Advanced Development Division, LG Display) ;
- Hong, Hyun-Seok (Advanced Development Division, LG Display) ;
- Kwack, Hee-Yong (Process Development Division, LG Display) ;
- Ahn, Sung-Hoon (Process Development Division, LG Display) ;
- Yu, Sang-Jeon (Process Development Division, LG Display) ;
- Shin, Jong-Keun (Advanced Development Division, LG Display)
- 발행 : 2009.10.12
초록
Amorphous silicon nitride (a-SiNx) passivation film as a passivation layer of TFT-LCDs was deposited by AC-reactive sputtering at low temperature. As a result, the electrical characteristics and reliability of TFT with novel passivation showed the same level as the conventional TFT. Finally, we have developed 47"Full HD IPS TFT-LCDs with sputtered amorphous silicon nitride. It is suitable for low temperature based applications such as OTFT and Flexible display.