한국정보디스플레이학회:학술대회논문집
- 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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- Pages.1025-1027
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- 2009
Novel deposition technology for nano-crystalline silicon thin film at low temperature by hyper-thermal neutral beam assisted CVD system
- Jang, Jin-Nyoung (Dept. of Display and Semiconductor Physics, Korea University) ;
- Song, Byoung-Chul (Dept. of Display and Semiconductor Physics, Korea University) ;
- Oh, Kyoung-Suk (National Fusion Research Institute) ;
- Yoo, Suk-Jae (National Fusion Research Institute) ;
- Lee, Bon-Ju (National Fusion Research Institute) ;
- Choi, Soung-Woong (National Fusion Research Institute) ;
- Park, Young-Chun (Dept. of Information Technology, Handong Global University) ;
- Hong, Mun-Pyo (Dept. of Display and Semiconductor Physics, Korea University)
- 발행 : 2009.10.12
초록
Novel low temperature deposition process for nano-crystalline Si thin film is developed with the hyper-thermal neutral beam (HNB) technology. By our HNB assisted CVD system, the reactive particles can induce crystalline phase in Si thin films and effectively combine with heating effect on substrate. At low deposition temperature under
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