ITO Thin Film Deposition on Polycarbonate Substrate using In-Line DC Magnetron Sputtering

  • Ahn, Min-Hyung (Department of Electronics Engineering, Kyungwon University) ;
  • Li, Zhao-Hui (Department of Electronics Engineering, Kyungwon University) ;
  • Choi, Kyung-Min (Department of Electronics Engineering, Kyungwon University) ;
  • Im, Seung-Hyeok (Department of Electronics Engineering, Kyungwon University) ;
  • Jung, Kyung-Seo (Department of Electronics Engineering, Kyungwon University) ;
  • Cho, Eou-Sik (Department of Electronics Engineering, Kyungwon University) ;
  • Kwon, Sang-Jik (Department of Electronics Engineering, Kyungwon University)
  • Published : 2009.10.12

Abstract

For the application of flexible substrate to future display and new transparent devices, indium tin oxide (ITO) thin film was formed on polycarbonate(PC) substrate at room temperature by in-line sputter system. During the ITO sputtering, Ar and $O_2$ reaction gas were fixed at a constant value and the process pressure was varied from 3 to 7 mtorr. From the electrical and the optical properties of sputtered ITO films, the sheet resistances of as-deposited ITO films varied with a different pressure and the optical transmittances of the ITO films at visible wavelength were maintained above 85%. The results are considered to be due to the saturation of $O_2$ atoms from reaction in ITO film.

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