Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2009.04b
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- Pages.57-57
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- 2009
Study on the variation of surface characteristics of organic films as a function of bias power by O2 plasma
O2 플라즈마 바이어스 파워에 따른 유기 박막의 표면 특성 변화 연구
- Ham, Yong-Hyun (Electronics and Telecommunications Research Institute) ;
-
Baek, Kyu-Ha
(Electronics and Telecommunications Research Institute)
;
-
Do, Lee-Mi
(Electronics and Telecommunications Research Institute)
;
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Sin, Hong-Sik
(Electronics and Telecommunications Research Institute)
;
- Park, Suk-Hyung (Korea university) ;
- Kwon, Kwang-Ho (Korea university)
- Published : 2009.04.03
Abstract
In this work, we carried out the variation of surface characteristics of organic polymer films by O2 plasma. The plasma diagnostics were performed by DLP(Double Langmuir Probe) and OES(Optical Emission Spectroscopy) measurements. Moreover, variation of surface characteristics were measured by AFM(Atomic Force Microscope), XPS(X-ray Photoelectron Spectroscopy), and contact angle goniometer. It was found that the etch rate of organic films was controlled by O radicals flux and dc bias voltage. And O radical density and dc bias voltage increased with increasing bias power. So, it was changed surface energy as a function of surface roughness and O/C ratio in organic films.